VAPOR-DEPOSITION DEVICE FOR COATING TWO-DIMENSIONAL SUBSTRATES

摘要

A vapor-deposition device for coating two-dimensional substrates with an organic material. The substrates can be positioned within a vacuum chamber above a process chamber or can be moved past the latter by a transport device. A vaporizer for an organic coating material is arranged within the process chamber and opposite the substrates. The process chamber is delimited laterally by shields which, opposite the substrates, extend as far as a feed device for the coating material. The vaporizer includes the feed device for the coating material and radiant heaters underneath the same. This arrangement can achieve, with a high vaporization rate, good homogeneity of the layer thickness and of the layer stoichiometry.

主权项

1. A vapor-deposition device for coating two-dimensional substrates with an organic material, which substrates can be positioned within a vacuum chamber above a process chamber or can be moved past the latter by a transport device, and in which a vaporizer for an organic coating material is arranged within the process chamber and opposite the substrates, wherein the process chamber is delimited laterally by shields which, opposite the substrates, extend as far as a feed device for the coating material, and wherein the vaporizer comprises the feed device for the coating material and radiant heaters underneath the same.