SLURRY PHASE DIRECT SYNTHESIS OF ORGANOHALOSILANES FROM CYCLONE FINES

摘要

The present invention is directed to a process for the synthesis of organohalosilane monomers, comprising the steps of (1) forming a slurry of cyclone fines, ultra fines and/or spent contact mass in a thermally stable solvent and reacting the agitated slurry with an organohalide of the formula R1X in the presence of an additive for a time and at a temperature sufficient to produce organohalosilane monomers having the formulae R1SiHX2, R1 2SiHX, R1 3SiX, R1SiX3, and R1 2SiX2; wherein R1 is a saturated or unsaturated aromatic group, a saturated or unsaturated aliphatic group, alkaryl group, or cycloaliphatic hydrocarbyl group, and X is a halogen; and (2) recovering said organohalosilane monomers.