| 摘要 |
PROBLEM TO BE SOLVED: To provide suitable scanning device and method which suppress the impact of charging due to irradiation with primary charged particle beam, in the observation using a scanning electron microscope, and the contrast of the contour of a two-dimensional pattern is enhanced while suppressing the shading, by enhancing the detection rate of secondary electrons.SOLUTION: A scanning electron microscope includes a GUI, sample information input means for inputting information about a sample, and display means for displaying the recommended scanning conditions on the GUI by inputting from the sample information input means. Scanning is performed with a scanning line density depending on the sample, by selecting the recommended scanning conditions. |
