| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a multi-port valve assembly that may regulate fluid communication between a chamber of a plasma processing device and vacuum pumps.SOLUTION: A plasma processing device 100 comprises a chamber 110, an electrode assembly 118, a wafer stage 120, a gas inlet 130, a plurality of vacuum ports 142, at least one vacuum pump 150, and a multi-port valve assembly 160. The multi-port valve assembly includes a movable seal plate 170 positioned in the processing chamber. The movable seal plate has a transverse port sealing surface 141 that is shaped and sized to completely overlap the plurality of vacuum ports in a closed state, to partially overlap the plurality of vacuum ports in a partially open state, and to avoid substantial overlap of the plurality of vacuum ports in an open state. The multi-port valve assembly includes a transverse actuator coupled to the movable seal plate and a sealing actuator coupled to the movable seal plate.</p> |
