发明名称 |
MECHANISMS FOR FORMING IMAGE SENSOR DEVICE |
摘要 |
Embodiments of mechanisms for forming an image sensor device are provided. The image sensor device includes a semiconductor substrate and one photodetector formed in the semiconductor substrate. The image sensor device also includes one gate stack formed over the semiconductor substrate. The gate stack includes multiple polysilicon layers. |
申请公布号 |
US2015060964(A1) |
申请公布日期 |
2015.03.05 |
申请号 |
US201314016996 |
申请日期 |
2013.09.03 |
申请人 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
发明人 |
LAI Chih-Yu;WU Cheng-Ta;TU Yeur-Luen;TSAI Chia-Shiung;SZE Jhy-Jyi;TING Shyh-Fann;WANG Ching-Chun |
分类号 |
H01L27/146;H01L31/18 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
1. An image sensor device, comprising:
a semiconductor substrate; at least one photodetector formed in the semiconductor substrate; and at least one gate stack formed over the semiconductor substrate, wherein the at least one gate stack comprises a plurality of polysilicon layers. |
地址 |
Hsin-Chu TW |