| 摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in LWR (line edge roughness) performance, resolution, rectangularity in a cross-sectional shape, focal depth, and film shrink suppressing property.SOLUTION: The radiation-sensitive resin composition comprises a polymer having a structural unit including at least one structure selected from the group consisting of moiety structures of an acetal bond, a radiation-sensitive acid generator, and a solvent. A method for forming a resist pattern is provided, including steps of forming a resist film from the above radiation-sensitive resin composition, exposing the resist film and developing the exposed resist film. |
