ADVANCED CORRECTION METHOD

摘要

An advanced correction method is provided. A target layout pattern is provided, and is corrected by a correction model to obtain a corrected pattern. A simulation is performed on the corrected pattern to obtain a simulation contour. A plurality of off-target evaluation points are established on the simulation contour, the simulation contour is compared with a target layout pattern, and a plurality of risk weighting values of each of the off-target evaluation points are obtained. A risk sum value obtained by summing up the risk weighting values of each of the off-target evaluation points is sorted into a processing sequence in descending manner. The target layout pattern is identified, classified and grouped into a plurality of pattern blocks. The corrected pattern is modified according to the processing sequence, so as to converge the simulation contour of the corrected pattern being modified to be close to the target layout pattern.

主权项

1. An advanced correction method, comprising:
providing a target layout pattern; dissecting the target layout pattern and establishing a plurality of evaluation points; correcting the target layout pattern by a correction model to obtain a corrected pattern; performing a simulation on the corrected pattern to obtain a simulation contour; calculating a difference between the simulation contour and the target layout pattern at each of the evaluation points on the target layout pattern, wherein the evaluation point having the difference being greater than a standard value is classified into an off-target evaluation point; obtaining a plurality of risk weighting values of each of the off-target evaluation points according to a plurality of influential factors influencing the simulation contour to deviate from the target layout pattern and a plurality of preset condition ranges. summing up the risk weighting values of each of the off-target evaluation points to obtain a risk sum value of each of the off-target evaluation points; sorting the risk sum values of the off-target evaluation points into a processing sequence in descending manner; identifying, classifying and grouping the target layout pattern into a plurality of pattern blocks; and modifying the corrected pattern according to the processing sequence to converge the simulation contour of the corrected pattern being modified to be close to the target layout pattern.