| 摘要 |
Disclosed is a method for generating PUF by causing an unpredictable partial process failure in a semiconductor process. Even in the case where a semiconductor design rule is not violated in a design stage, it is possible to print a second mask pattern by distorting the size and/or shape of at least one mask window included in the designed first mask pattern. Further, a PUF can be generated by using a photo mask, including the printed second mask pattern, when performing photo lithography. |
