发明名称 SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
摘要 A method of manufacturing a semiconductor structure includes several operations. The several operations include placing a plurality of dies on a carrier; defining a first zone and a second zone in a top surface of the carrier; calculating a first coverage ratio in the first zone; calculating a second coverage ratio in the second zone; disposing a dummy block on a specified location of the top surface of the carrier if the difference between the first coverage ratio and the second coverage ratio is greater than a predetermined value; forming a molding compound on the carrier.
申请公布号 US2015061162(A1) 申请公布日期 2015.03.05
申请号 US201314013503 申请日期 2013.08.29
申请人 Taiwan Semiconductor Manufacturing Company Ltd. 发明人 YU CHEN-HUA;LII MIRNG-JI;LIU CHUNG-SHI;HUANG CHANG-CHIA;LIN CHIH-WEI;CHENG MING-DA
分类号 H01L25/065;H01L23/00 主分类号 H01L25/065
代理机构 代理人
主权项 1. A method of manufacturing a semiconductor structure, comprising: attaching a plurality of dies to a top surface of a carrier; placing a dummy block on a specified uncovered area of the top surface; depositing a molding compound over the top surface of the carrier; wherein the block has a coefficient of thermal expansion (CTE) between a CTE of the plurality of dies and the carrier.
地址 Hsinchu TW