发明名称 |
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF |
摘要 |
A method of manufacturing a semiconductor structure includes several operations. The several operations include placing a plurality of dies on a carrier; defining a first zone and a second zone in a top surface of the carrier; calculating a first coverage ratio in the first zone; calculating a second coverage ratio in the second zone; disposing a dummy block on a specified location of the top surface of the carrier if the difference between the first coverage ratio and the second coverage ratio is greater than a predetermined value; forming a molding compound on the carrier. |
申请公布号 |
US2015061162(A1) |
申请公布日期 |
2015.03.05 |
申请号 |
US201314013503 |
申请日期 |
2013.08.29 |
申请人 |
Taiwan Semiconductor Manufacturing Company Ltd. |
发明人 |
YU CHEN-HUA;LII MIRNG-JI;LIU CHUNG-SHI;HUANG CHANG-CHIA;LIN CHIH-WEI;CHENG MING-DA |
分类号 |
H01L25/065;H01L23/00 |
主分类号 |
H01L25/065 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a semiconductor structure, comprising:
attaching a plurality of dies to a top surface of a carrier; placing a dummy block on a specified uncovered area of the top surface; depositing a molding compound over the top surface of the carrier; wherein the block has a coefficient of thermal expansion (CTE) between a CTE of the plurality of dies and the carrier. |
地址 |
Hsinchu TW |