| 发明名称 |
CHARGED PARTICLE BEAM APPARATUS |
| 摘要 |
A charged particle beam apparatus includes: an electron beam irradiation unit irradiating a sample with electron beams having a first irradiation axis; a rotation stage holding the sample and having a rotation axis in a direction perpendicular to the first irradiation axis; an ion beam irradiation unit irradiating the sample with ion beams having a second irradiation axis that is substantially parallel to the rotation axis; a detection unit detecting at least one of charged particles and X rays generated via the sample by the irradiation with the ion beams and electron beams; and a gaseous ion beam irradiation unit irradiating the sample with gaseous ion beams. |
| 申请公布号 |
US2015060695(A1) |
申请公布日期 |
2015.03.05 |
| 申请号 |
US201414470183 |
申请日期 |
2014.08.27 |
| 申请人 |
HITACHI HIGH-TECH SCIENCE CORPORATION |
发明人 |
MAN Xin;ASAHATA Tatsuya;UEMOTO Atsushi |
| 分类号 |
H01J37/317;H01J37/244;H01J37/20 |
主分类号 |
H01J37/317 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A charged particle beam apparatus comprising:
an electron beam irradiation unit configured to irradiate a sample with electron beams having a first irradiation axis; a rotation stage, which is configured to hold the sample, and which has a rotation axis in a direction perpendicular to the first irradiation axis; an ion beam irradiation unit configured to irradiate the sample with ion beams having a second irradiation axis that is substantially parallel to the rotation axis; a detection unit configured to detect at least one of charged particles and X rays generated via the sample by the irradiation with the ion beams and electron beams; and a gaseous ion beam irradiation unit configured to irradiate the sample with gaseous ion beams. |
| 地址 |
Tokyo JP |
