| 摘要 |
PROBLEM TO BE SOLVED: To provide an optical system for a micro lithography projection exposure apparatus that can flexibly change an intensity distribution set to an illumination device in addition to relatively low structural costs and relatively compact design.SOLUTION: An optical system for a micro lithography projection exposure apparatus includes an optical axis OA, and at least one mirror device 200 including a plurality of mirror elements, where the mirror elements can be each individually adjusted in order to change an angle distribution of light reflected on the mirror device and a deflection device 210; the deflection device 210 includes at least one deflection surface on which the deflection of the optical axis OA occurs with respect to an optical beam path on the downstream of the mirror device 200; and the at least one deflection surface has refractive power. |
