发明名称 |
IMAGE SENSORS OPERABLE IN GLOBAL SHUTTER MODE AND HAVING SMALL PIXELS WITH HIGH WELL CAPACITY |
摘要 |
An image sensor operable in global shutter mode ma include small pixels with high charge storage capacity, low dark current, and no image lag. Storage capacity of a photodiode and a charge storage diode may be increased by placing a p+ type doped layer under the photodiode and the charge storage diode. The p+ type doped layer ma include an opening for allowing photo-generated charge carriers to flow from the silicon bulk to the charge storage well located near the surface of the photodiode. A compensating n− type doped implant may be formed in the opening. Image lag is prevented by placing a p− type doped region under the p+ type doped photodiode pinning layer and aligned with the opening. The p+ type doped layer may extend under the entire pixel array. |
申请公布号 |
US2015060951(A1) |
申请公布日期 |
2015.03.05 |
申请号 |
US201414468186 |
申请日期 |
2014.08.25 |
申请人 |
Aptina Imaging Corporation |
发明人 |
Hynecek Jaroslav |
分类号 |
H01L27/146;H01L31/028 |
主分类号 |
H01L27/146 |
代理机构 |
|
代理人 |
|
主权项 |
1. An image sensor pixel in a pixel array having a silicon substrate, comprising:
a photodiode and a charge storage diode formed in a surface of the silicon substrate, wherein the silicon substrate includes a hulk portion under the photodiode and the charge storage diode; a p+ type doped layer that extends under the photodiode and the charge storage diode parallel to the surface, wherein the p+ type doped layer comprises an opening through which charge carriers pass from the bulk portion of the silicon substrate to the photodiode; and a compensating n− type doped implant region in the opening. |
地址 |
George Town KY |