| 发明名称 |
APPARATUS FOR PROCESSING SUBSTRATE AND METHOD OF CLEANING SAME |
| 摘要 |
Provided is an apparatus for processing a substrate including a spin head on which a substrate is placed, a container provided to surround the spin head, an upper nozzle member supplying a processing solution downwards, a bottom cleaning member located to be a certain distance from the bottom of the spin head, wherein the bottom cleaning member sprays a cleaning solution to the bottom of the spin head. |
| 申请公布号 |
US2015059808(A1) |
申请公布日期 |
2015.03.05 |
| 申请号 |
US201414473193 |
申请日期 |
2014.08.29 |
| 申请人 |
Semes Co., Ltd. |
发明人 |
YU Jintack;LEE Jae-Myoung |
| 分类号 |
B08B3/02 |
主分类号 |
B08B3/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An apparatus for processing a substrate, the apparatus comprising:
a spin head on which a substrate is placed; a container provided to surround the spin head; an upper nozzle member supplying a processing solution downwards; a bottom cleaning member located to be a certain distance from the bottom of the spin head, wherein the bottom cleaning member sprays a cleaning solution to the bottom of the spin head. |
| 地址 |
Cheonan-si KR |
