A method for an improved doping process allows for improved control of doping concentrations on a substrate. The method may comprise printing a polymeric material on a substrate in a desired pattern; and depositing a barrier layer on the substrate with a liquid phase deposition process, wherein a pattern of the barrier layer is defined by the polymeric material. The method further comprises removing the polymeric material, and doping the substrate. The barrier layer substantially prevents or reduces doping of the substrate to allow patterned doping regions to be formed on the substrate. The method can be repeated to allow additional doping regions to be formed on the substrate.
申请公布号
WO2014176396(A3)
申请公布日期
2015.03.05
申请号
WO2014US35243
申请日期
2014.04.24
申请人
NATCORE TECHNOLOGY, INC.
发明人
LEVY, DAVID H.;MARGADONNA, DANIELE;FLOOD, DENNIS;AHEARN, WENDY G.;TOPEL, JR., RICHARD W.;ZUBIL, THEODORE