| 发明名称 |
METHOD OF MAKING SEMICONDUCTOR DEVICES AND A CONTROL SYSTEM FOR PERFORMING THE SAME |
| 摘要 |
A method of making a semiconductor device includes collecting process control parameters during operation of a processing tool processing a product. The method further includes calculating a processing tool offset for the processing tool based on the collected process control parameters and calculating a product offset based on the collected process control parameters. The method further includes determining whether the product offset is stable and calculating an offset time for processing the product using the processing tool based on the calculated processing tool offset if the product offset is stable. |
| 申请公布号 |
US2015066183(A1) |
申请公布日期 |
2015.03.05 |
| 申请号 |
US201314015346 |
申请日期 |
2013.08.30 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
NAN Ching-Hsi;FU Yu-Hsiu;CHANG Chia Jung |
| 分类号 |
H01L21/02;G05B19/418 |
主分类号 |
H01L21/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of making a semiconductor device comprising:
collecting one or more process control parameters during operation of a processing tool processing a product; calculating a processing tool offset for the processing tool based on the collected process control parameters; calculating a product offset based on the collected process control parameters; determining whether the product offset is stable; and calculating an offset time for processing the product using the processing tool based on the calculated processing tool offset if the product offset is stable. |
| 地址 |
Hsinchu TW |
