| 主权项 |
1. A method for manufacturing a solid-state image sensor including a first pixel and a second pixel in a semiconductor substrate,
the first pixel including a first charge accumulation portion of a first conductivity type in a first region, and the second pixel including a second charge accumulation portion of the first conductivity type in a second region, and a semiconductor region of a second conductivity type in a third region, the second conductivity type being different from the first conductivity type, the method comprising the steps of: forming the first charge accumulation portion and the second charge accumulation portion; and forming the semiconductor region, wherein in the step of forming the semiconductor region, impurities of the second conductivity type are doped in the third region, and the impurities of the second conductivity type are doped in at least the second region to generate a first difference between a quantity of doping the impurities of the second conductivity type in the first region, and a quantity of doping the impurities of the second conductivity type in the second region, and in the step of forming the first charge accumulation portion and the second charge accumulation portion, impurities are doped in the first region and the second region to reduce a second difference, caused by the first difference, between a net quantity of doping impurities of the first conductivity type in the first region, and a net quantity of doping the impurities of the first conductivity type in the second region. |
