RUBBING DEVICE AND RUBBING METHOD

摘要

The present invention relates to a rubbing device and a rubbing method. The rubbing device includes: a substrate carrier, an aligning roller having a surface that is rubbing fabric, a driving mechanism that drives the substrate carrier and the substrate that is to be subjected to alignment treatment carried thereby to undergo a translational movement, and an elevation arm. The lower surface of the aligning roller is made suitable to contact and rub the upper surface of the substrate that is to be subjected to alignment treatment and side edges of the upper surface of the substrate that is to be subjected to alignment treatment are made suitable to scrape the lower surface of the aligning roller. The substrate carrier is provided in a top thereof with channels corresponding to two opposite side edges of the substrate that is to be subjected to alignment treatment in the translational movement direction. The channels are arranged to be suitable to have the two side edges of the substrate that is to be subjected to alignment treatment respectively suspending in the channels. The present invention also provides a rubbing method. The rubbing device and the rubbing method of the present invention use a substrate that is to be subjected to alignment treatment to scrape PI chips from the aligning roller into channels so as to prevent the PI chips from moving with the aligning roller to spread over an AA zone of the substrate that is to be subjected to alignment treatment, thereby improving the defects of bright spots and mura generated in a rubbing process.

主权项

1. A rubbing device, comprising: a substrate carrier for carrying a substrate that is to be subjected to alignment treatment, an aligning roller having a surface that is rubbing fabric, a driving mechanism that drives the substrate carrier and the substrate that is to be subjected to alignment treatment carried thereby to undergo a translational movement with respect to the aligning roller, and an elevation arm that adjusts a relative vertical distance between a lower surface of the aligning roller and an upper surface of the substrate that is to be subjected to alignment treatment, the relative vertical distance being arranged to have the lower surface of the aligning roller suitable to contact and rub the upper surface of the substrate that is to be subjected to alignment treatment and also to have side edges of the upper surface of the substrate that is to be subjected to alignment treatment suitable to scrape the lower surface of the aligning roller, the substrate carrier being provided in a top thereof with channels corresponding to the two opposite side edges of the substrate that is to be subjected to alignment treatment in the translational movement direction, the channels being arranged to be suitable to have the two side edges the substrate that is to be subjected to alignment treatment respectively suspending in the channels.