发明名称 BARRIER LAMINATE, GAS BARRIER FILM AND DEVICE
摘要 The present invention provides a barrier laminate which comprises an inorganic layer and a first organic layer, and wherein: the inorganic layer and the first organic layer are in direct contact with each other; the first organic layer is formed by curing a polymerizable composition that contains a polymerizable compound, a polymerization initiator and a silane coupling agent represented by general formula (1) (wherein R2 represents a halogen element or an alkyl group; R3 represents a hydrogen atom or an alkyl group; L represents a divalent linking group; and n represents an integer of 0-2); the first organic layer contains titanium oxide fine particles; and the inorganic layer is formed on the surface of the first organic layer by a chemical vapor deposition method. The present invention also provides: a gas barrier film which comprises the barrier laminate; and a device which comprises the barrier laminate. This barrier laminate according to the present invention has high barrier properties and transparency.
申请公布号 WO2015030178(A1) 申请公布日期 2015.03.05
申请号 WO2014JP72749 申请日期 2014.08.29
申请人 FUJIFILM CORPORATION 发明人 MUKAI ATSUSHI;YAMADA MAKOTO;MOTOMURA YUYA
分类号 B32B9/00;B32B27/18;B32B27/30;C23C16/42;H01L31/048;H01L51/50;H05B33/04 主分类号 B32B9/00
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