| 摘要 |
<p>An apparatus comprising: a first sensor comprising a sensing material that is sensitive to a first parameter and a second parameter, wherein sensitivity to the first parameter changes sensitivity to the second parameter. The sensitivity of the first sensor to one of the first and the second parameters may be controlled by maintaining, as a constant, the other of the first and the second parameters. The apparatus may comprise a second sensor sensitive to at least one of the first parameter and the second parameter. The first parameter may be deformation and the second parameter may be a concentration of a gaseous analyte such as, for example, humidity. The second sensor may comprise the sensing material that is sensitive to the first parameter and the second parameter.</p> |
