| 摘要 |
PROBLEM TO BE SOLVED: To form a diamond film on a base member, e.g. a hard metal or an iron group metal, in a state free of effects of e.g. member ingredients.SOLUTION: A method of forming a deposition surface in a substrate for diamond deposition includes (1) a step of covering a part of the surface of a base material composed of a hard material with a matrix containing one or more selected from first metals of the first metal group comprising Si, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo and W and/or first metal compounds consisting of compounds of the first metals with a non-metal substance selected from boron, carbon and nitrogen, (2) a step of distributing diamond particles of average particle sizes of 1 μm or smaller on the surface of the base material and (3) a step of holding the diamond particles with the matrix containing one or both of the first metals and the first metal compounds. In the boundary between the base material composed of the hard material and the matrix, joint parts in which atoms of the first metal and/or the metal atoms constituting the hard material are dispersed are formed. |
