发明名称 METHODS FOR MAKING MICRO- AND NANO-SCALE CONDUCTIVE GRIDS FOR TRANSPARENT ELECTRODES AND POLARIZERS BY ROLL TO ROLL OPTICAL LITHOGRAPHY
摘要 Methods of micro- and nano-patterning substrates to form transparent conductive electrode structures or polarizers by continuous near-field optical nanolithography methods using a roll-type photomask or phase-shift mask are provided. In such methods, a near-field optical nanolithography technique uses a phase-shift or photo-mask roller that comprises a rigid patterned externally exposed surface that transfers a pattern to an underlying substrate. The roller device may have an internally disposed radiation source that generates radiation that passes through the rigid patterned surface to the substrate during the patterning process. Sub-wavelength resolution is achieved using near-field exposure of photoresist material through the cylindrical rigid phase-mask, allowing dynamic and high throughput continuous patterning.
申请公布号 US2015064628(A1) 申请公布日期 2015.03.05
申请号 US201314395358 申请日期 2013.04.15
申请人 THE REGENTS OF THE UNIVERSITY OF MICHIGAN 发明人 Guo Lingjie Jay
分类号 G03F7/20;G03F7/30 主分类号 G03F7/20
代理机构 代理人
主权项 1. A method for forming a conductive micro-grating or nano-grating structure comprising: passing a substrate comprising a layer of conductive material having a radiation curable photoresist material disposed thereon under a rigid patterned surface of a roller device; directing radiation from inside the roller device through one or more regions of the rigid patterned surface to the radiation curable photoresist material, so as to cure one or more preselected regions of the radiation curable photoresist material on the substrate, wherein the radiation is either generated from a radiation source disposed inside the roller device or the radiation is reflected by a reflector device disposed inside the roller device that reflects radiation from an external source directed at the roller device; removing the uncured photoresist material and the underlying conductive material in regions outside the one or more preselected regions; and removing the cured photoresist material from the one or more preselected regions, so that the underlying conductive material defines the conductive micro-grating or nano-grating structure.
地址 Ann Arbor MI US