CHARGED PARTICLE BEAM DEVICE AND ARITHMETIC DEVICE

摘要

It is possible to determine an optimal parasitic aberration adjustment amount even when the relationship of the parasitic aberration adjustment amount with respect to the field intensity of multiple poles changes nonlinearly. To this end, in the present invention, an aberration correction amount is computed by measuring an aberration coefficient of an optical unit of a charged particle beam device, and at the same time, the present value of a power supply control value applied to an aberration corrector is measured. Then, the parasitic aberration adjustment amount for suppressing the amount of a parasitic aberration generated in the aberration corrector is computed on the basis of the aberration correction amount and the present value of the power supply control value.

主权项

1. A charged particle beam device comprising:
a charged particle source configured to emit a charged particle beam; a condenser lens configured to converge the charged particle beam; an aberration corrector having multiple stages of multiple poles and configured to correct an aberration of an optical unit; an aberration corrector controlling power supply configured to generate power to be applied to the multiple poles; an aberration coefficients estimation unit configured to measure an aberration coefficient of the optical unit; an aberration correction target estimation unit configured to compute an aberration correction amount on the basis of the aberration coefficient; an aberration corrector power output value measurement unit configured to measure a present value of a power supply control value applied to the multiple poles from the aberration corrector controlling power supply; and an arithmetic device configured to compute a power supply control value for aberration correction to be applied to the multiple poles on the basis of the measured value of the power supply control value and the aberration correction amount.