| 摘要 |
The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use.;Specifically, the invention pertains to a compounds having the following structure (I):;;wherein M is a metal and n is 1 to 20, and wherein at least one of R1, R2, R3, and R4 is i) and at least at least one of R1, R2, R3, and R4 is ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety.;The invention also relates to spin-coatable composition of compounds of structure (I) dissolved into a solvent. The present invention further relates to processes using this spin coatable composition to form a coating on a patterned substrate. |
| 主权项 |
1. A soluble, multi-ligand-substituted metal compound of structure (I): wherein M is a metal and n is 1 to 20, and wherein at least one of R1, R2, R3, and R4 is i) and at least one of R1, R2, R3, and R4 s ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety (II), wherein R8 is selected from a group consisting of C2-C10 alkylene, C3-C12 branched alkylene, C5-C12 cycloalkylene, C2-C10 alkylene containing a C═C double bond, C3-C12 branched alkylene containing a C═C double bond, and a C5-C12 cycloalkylene containing a C═C double bond, and R9 is hydrogen or the alkyloxycarbonyl moiety (III), where R10 is a C1-C8 alkyl group, provided that the silicon bearing moiety bearing an organic moiety having at least 2 carbons i) ranges from about 10 mole % to about 80 mole %, and ii) ranges from about 20 mole % to about 90 mole % of the total groups R1, R2, R3, and R4. |
