| 摘要 |
The invention relates to a method for obtaining a substrate coated on at least one face thereof with a low-emittance stack of thin films, said method comprising the following steps consisting in: depositing on at least one face of the substrate a stack of thin films including at least one thin silver film between two thin dielectric films; and heat treating the at least one coated face with at least one laser radiation emitted at at least one wavelength of between 500 and 2000 nm, such that the emissivity and/or square resistance of the stack is reduced by at least 5 %. According to the invention, prior to treatment, the stack includes at least one thin film that at least partially absorbs laser radiation and, consequently, the absorption of the stack at at least one laser radiation wavelength is such that the absorption of a 4 mm-thick clear glass substrate coated with this stack at the at least one laser radiation wavelength is greater than or equal to 10 %. |
