| 发明名称 |
STANDARD SAMPLE AND METHOD OF PREPARING SAME |
| 摘要 |
In one embodiment, a method of preparing a standard sample includes forming a second layer containing an analysis target element on a substrate via a first layer. The method further includes dissolving the first and second layers to form a plurality of droplets containing the analysis target element on the substrate. The method further includes drying the droplets to form a plurality of particles containing the analysis target element on the substrate. |
| 申请公布号 |
US2015059496(A1) |
申请公布日期 |
2015.03.05 |
| 申请号 |
US201414172662 |
申请日期 |
2014.02.04 |
| 申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
ITO Shoko |
| 分类号 |
G01N1/28;G01N33/00 |
主分类号 |
G01N1/28 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of preparing a standard sample, comprising:
forming a second layer containing an analysis target element on a substrate via a first layer; dissolving the first and second layers to form a plurality of droplets containing the analysis target element on the substrate; and drying the droplets to form a plurality of particles containing the analysis target element on the substrate. |
| 地址 |
Tokyo JP |
