| 发明名称 |
MICROWAVE PLASMA REACTORS AND SUBSTRATES FOR SYNTHETIC DIAMOND MANUFACTURE |
| 摘要 |
The present disclosure relates to substrates for use in microwave plasma reactors. Certain substrates include a cylindrical disc of a carbide forming refractory metal having a flat growth surface on which CVD diamond is to be grown and a flat supporting surface opposed to said growth surface. The cylindrical disc may have a diameter of 80 mm or more. The growth surface may have a flatness variation no more than 100 mm The supporting surface may have a flatness variation no more than 100 mm. |
| 申请公布号 |
US2015061191(A1) |
申请公布日期 |
2015.03.05 |
| 申请号 |
US201414484100 |
申请日期 |
2014.09.11 |
| 申请人 |
Element Six Limited |
发明人 |
Dodge Carlton Nigel;Inglis Paul Nicolas;Scarsbrook Geoffrey Alan;Mollart Timothy Peter;Pickles Charles Simon James;Coe Steven Edward;Dodson Joseph Michael;Cullen Alexander Lamb;Brandon John Robert;Wort Christopher John Howard |
| 分类号 |
C23C16/27;C23C16/56;C01B31/06;C23C16/511 |
主分类号 |
C23C16/27 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A substrate for use in a microwave plasma reactor, the substrate comprising:
a cylindrical disc of a carbide forming refractory metal having a flat growth surface on which CVD diamond is to be grown and a flat supporting surface opposed to said growth surface, wherein the cylindrical disc has a diameter of 80 mm or more, wherein the growth surface has a flatness variation no more than 100 μm, and wherein the supporting surface has a flatness variation no more than 100 μm. |
| 地址 |
Ballasalla IM |
