| 摘要 |
<p>The present invention provides a cold spray powder making it possible to obtain a dense and thick sediment obtained by cold-spraying a dense sediment comprising a hard material having a high melting point, and provides a method for manufacturing a sputtering target in which the powder is used. The cold-spray powder has a cumulative particle size distribution such that the 10% particle diameter (D10) is 4.0 to 7.0μm, the 50% particle diameter is 7.0 to 11.0μm, and the 90% particle diameter is 11.0 to 16.0μm. A sputtering target may be obtained by cold-spraying a mass of the powder on the substrate to yield a bulk form.</p> |
