发明名称 PROCESSING LIQUID FOR SUPPRESSING PATTERN COLLAPSE OF MICROSTRUCTURE, AND METHOD FOR PRODUCING MICROSTRUCTURE USING SAME
摘要 There are provided a processing liquid for suppressing pattern collapse of a microstructure formed of polysilicon which includes at least one compound selected from the group consisting of pyridinium halides containing an alkyl group having 12, 14 or 16 carbon atoms, and water; and a method for producing a microstructure using the processing liquid.
申请公布号 EP2615631(A4) 申请公布日期 2015.03.04
申请号 EP20110823334 申请日期 2011.07.14
申请人 MITSUBISHI GAS CHEMICAL COMPANY, INC. 发明人 MATSUNAGA, HIROSHI;OHTO, MASARU
分类号 B81C1/00;H01L21/02;H01L21/311 主分类号 B81C1/00
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