STRAP FOR PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING APPARATUS HAVING THE SAME

摘要

The present invention relates to a strap for a plasma processing apparatus, and a plasma processing apparatus having the same which includes a body and uneven parts. The body includes coupling parts on both ends, and is bent into a concave shape toward a center part. One or more uneven parts are formed in a portion of the body which is bent to the concave shape. Accordingly, the strap for a plasma processing apparatus and the plasma processing apparatus having the same can distribute a stress applied to the strap, and prevents the disconnection of the strap by preventing a solid solution strengthening development in accordance to the exposure of a fluorine element. Accordingly, the present invention prevents frequent stops of a vapor-deposition process according to a frequent exchanges of the strap.