发明名称 PROCESS FOR FORMING THE STRONTIUM-CONTAINING THIN FILM
摘要 <p>The present invention provides a process for forming a strontium-containing thin film of a cyclopentadienyl-based strontium compound, which is in the liquid state at room temperature to 50° C., can be purified by distillation, present as a monomer, has high vapor pressure, and suitable for mass production. bis(propyltetramethylcyclopentadienyl)strontium is used as an Sr source to form a strontium-containing thin film such as a SrTiO3 film, a (Ba, Sr)TiO3 film by chemical vapor deposition or atomic layer deposition.</p>
申请公布号 KR101498732(B1) 申请公布日期 2015.03.04
申请号 KR20080059547 申请日期 2008.06.24
申请人 发明人
分类号 H01L21/20;H01L21/205;H01L21/316 主分类号 H01L21/20
代理机构 代理人
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