| 摘要 |
This invention provides a thin film photovoltaic cell in which the effective area of a transparent electrode layer is expanded and the output of the thin film photovoltaic cell is increased, and moreover the insulating properties at the second penetrating hole are secured so that the defect rate during manufacture of the thin film photovoltaic cell can be lowered; and also provides a method of manufacture of the thin film photovoltaic cell. The thin film photovoltaic cell is configured such that a rear face electrode layer, a photoelectric conversion layer and a transparent electrode layer are stacked in this order on one face of an insulating substrate, a back face electrode layer is deposited on the other face, and both electrode layers are electrically connected via a second penetrating hole which penetrates the insulating substrate; and is further configured such that a protective layer is provided at least in a region which surrounds the second penetrating hole and which is located between the transparent electrode layer and the photoelectric conversion layer stacked on the rear face electrode layer, or between the rear face electrode layer and the photoelectric conversion layer, and by using a laser to remove a transparent electrode on the periphery of the second penetrating hole in the region in which the protective layer is formed, the two electrode layers are electrically insulated. |
