发明名称 半導体装置の作製方法
摘要 In a thin film transistor, an increase in off current or negative shift of the threshold voltage is prevented. In the thin film transistor, a buffer layer is provided between an oxide semiconductor layer and each of a source electrode layer and a drain electrode layer. The buffer layer includes a metal oxide layer which is an insulator or a semiconductor over a middle portion of the oxide semiconductor layer. The metal oxide layer functions as a protective layer for suppressing incorporation of impurities into the oxide semiconductor layer. Therefore, in the thin film transistor, an increase in off current or negative shift of the threshold voltage can be prevented.
申请公布号 JP5679486(B2) 申请公布日期 2015.03.04
申请号 JP20130211193 申请日期 2013.10.08
申请人 发明人
分类号 H01L21/336;G02F1/1368;H01L21/28;H01L29/417;H01L29/786;H01L51/50;H05B33/14 主分类号 H01L21/336
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