发明名称 |
Fin-like field effect transistor (FinFET) based, metal-semiconductor alloy fuse device and method of manufacturing same |
摘要 |
A fuse device and method for fabricating the fuse device is disclosed. An exemplary fuse device includes a first contact and a second contact coupled with a metal-semiconductor alloy layer, wherein the metal-semiconductor alloy layer extends continuously between the first contact and the second contact. The metal-semiconductor alloy layer is disposed over an epitaxial layer that is disposed over a fin structure of a substrate. |
申请公布号 |
US8969999(B2) |
申请公布日期 |
2015.03.03 |
申请号 |
US201113283127 |
申请日期 |
2011.10.27 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Liang Minchang;Wu Shien-Yang;Kung Wei-Chang |
分类号 |
H01L27/12;H01L23/52;H01L23/525;H01L27/112;H01L29/78;H01L27/105 |
主分类号 |
H01L27/12 |
代理机构 |
Haynes and Boone, LLP |
代理人 |
Haynes and Boone, LLP |
主权项 |
1. A device comprising:
a semiconductor substrate; a fin structure disposed over the semiconductor substrate, wherein the fin structure includes at least two fins disposed over the semiconductor substrate, wherein the at least two fins includes a first fin and a second fin disposed over and physically contacting the semiconductor substrate; a dielectric isolation feature extending from the first fin to the second fin, wherein the dielectric isolation feature physically contacts the first and second fins; an epitaxial semiconductor feature disposed over each of the at least two fins; a metal-semiconductor alloy feature disposed over the epitaxial semiconductor feature of each of the at least two fins; and a first contact and a second contact coupled with the metal-semiconductor alloy feature, wherein the metal-semiconductor alloy feature extends continuously between the first contact and the second contact. |
地址 |
Hsin-Chu TW |