发明名称 |
Solid state light emitting devices based on crystallographically relaxed structures |
摘要 |
The present invention discloses a method for manufacturing a solid state light emitting device having a plurality of light-sources, the method comprising the steps of: providing a substrate having a growth surface; providing a mask layer on the growth surface, the mask layer having a plurality of openings through which the growth surface is exposed, wherein a largest lateral dimension of each of said openings is less than 0.3 μm and wherein the mask layer may comprise a first mask layer portion and a second mask layer portion, having the same surface area and comprising a plurality of openings wherein the first mask layer portion exhibits a first ratio between an exposed area of the growth surface and an unexposed area of the growth surface, and wherein the second mask layer portion exhibits a second ratio between an exposed area of the growth surface and an unexposed area of said growth surface, the second ratio being different from the first ratio; growing a base structure on the growth surface in each of the openings of the mask layer; and growing at least one light-generating quantum well layer on the surface of each of the base structures. |
申请公布号 |
US8969890(B2) |
申请公布日期 |
2015.03.03 |
申请号 |
US201113879824 |
申请日期 |
2011.10.20 |
申请人 |
Koninklijke Philips N.V. |
发明人 |
Balkenende Abraham Rudolf;Verschuuren Marcus Antonius;Immink George |
分类号 |
H01L29/20;H01L21/00;H01L33/06;H01L21/02;H01L27/15;H01L33/00;H01L33/12;H01L33/24 |
主分类号 |
H01L29/20 |
代理机构 |
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代理人 |
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主权项 |
1. A method for manufacturing a solid state light emitting device having a plurality of light sources, the method comprising the steps of:
providing a substrate having a growth surface; providing a mask layer on said growth surface, said mask layer having a plurality of openings through which said growth surface is exposed, wherein a largest lateral dimension of each of said openings is less than 0.3 μm and wherein said mask layer comprises a first mask layer portion and a second mask layer portion, each comprising a plurality of openings exposing said growth surface, wherein said first mask layer portion exhibits a first ratio between an exposed area of said growth surface and an unexposed area of said growth surface, and wherein said second mask layer portion exhibits a second ratio between an exposed area of said growth surface and an unexposed area of said growth surface, said second ratio being different from said first ratio; growing a base structure on said growth surface in each of said openings of said mask layer; and growing at least one light-generating quantum well layer on the surface of each of said base structures. |
地址 |
Eindhoven NL |