Photoresist composition, method of forming a pattern using the same, and method of manufacturing a display substrate

摘要

A photoresist composition, a method of forming a pattern using the photoresist composition, and a method of manufacturing a display substrate are disclosed. A photoresist composition includes an alkali-soluble resin, a quinone diazide-based compound, a multivalent phenol-based compound, and a solvent. Therefore, photosensitivity for light having a wavelength in a range of about 392 nm to about 417 nm may be improved, and reliability of forming a photo pattern and a thin film pattern using the photoresist composition may be improved.

主权项

1. A photoresist composition comprising:
an alkali-soluble resin; a quinone diazide-based compound; a multivalent phenol-based compound represented by Chemical Formula 1; and a solvent, wherein Chemical Formula 1 is represented by the following: wherein R1, R2, R3, R4 and R5 independently represent a hydrogen atom or a functional group represented by Chemical Formula 2, and wherein Chemical Formula 2 is represented by the following: wherein R6, R7, R8 and R9 independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, “n” represents an integer of 0 to 3, R10 represents an alkyl group having 1 to 6 carbon atoms or a cyclo-alkyl group having 3 to 12 carbon atoms, and a ring X represents a cycloaliphatic hydrocarbon group having 3 to 20 carbon atoms.