发明名称 |
Laser ablation tape for solder interconnect formation |
摘要 |
A tape capable of laser ablation may be used in the formation of microelectronic interconnects, wherein the tape may be attached to bond pads on a microelectronic device and vias may be formed by laser ablation through the tape to expose at least a portion of corresponding bond pads. The microelectronic interconnects may be formed on the bond pads within the vias, such as by solder paste printing and solder reflow. The laser ablation tape can be removed after the formation of the microelectronic interconnects. |
申请公布号 |
US8969134(B2) |
申请公布日期 |
2015.03.03 |
申请号 |
US201313891279 |
申请日期 |
2013.05.10 |
申请人 |
Intel Corporation |
发明人 |
Brun Xavier F.;Kumamoto Takashi;Ahmed Sufi |
分类号 |
H01L21/44;H01L21/48;H01L21/50;H01L23/00 |
主分类号 |
H01L21/44 |
代理机构 |
Winkle, PLLC |
代理人 |
Winkle, PLLC |
主权项 |
1. A method of forming microelectronic devices, the method comprising:
providing a microelectronic device having at least one bond pad projecting above an active surface of the microelectronic device; attaching a laser ablation tape to the at least one bond pad; laser ablating at least one via through the laser ablation tape to expose at least a portion of the at least one bond pad; forming a microelectronic interconnect on the at least one bond pad within the at least one via; and removing the laser ablation tape. |
地址 |
Santa Clara CA US |