| 发明名称 | Lithographic apparatus and component with repeating structure having increased thermal accommodation coefficient | ||
| 摘要 | A lithographic apparatus includes a substrate table constructed to hold a substrate, and a projection system configured to project a patterned radiation beam onto a target portion of the substrate. A surface of a component of the lithographic apparatus that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface. | ||
| 申请公布号 | US8970818(B2) | 申请公布日期 | 2015.03.03 |
| 申请号 | US201213478888 | 申请日期 | 2012.05.23 |
| 申请人 | ASML Netherlands B.V. | 发明人 | Nienhuys Han-Kwang;Janssen Franciscus Johannes Joseph;Pekelder Sven;Schmitz Roger Wilhelmus Antonius Henricus;Huijberts Alexander Marinus Arnoldus;Gasseling Paulus Albertus Maria |
| 分类号 | G03B27/52;G03F7/20 | 主分类号 | G03B27/52 |
| 代理机构 | Pillsbury Winthrop Shaw Pittman LLP | 代理人 | Pillsbury Winthrop Shaw Pittman LLP |
| 主权项 | 1. A lithographic apparatus comprising: a substrate table constructed to hold a substrate; and a projection system configured to project a patterned radiation beam onto a target portion of the substrate; wherein a surface of a component of the lithographic apparatus in a vacuum environment, in use, is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface, the component selected from the group consisting of a wall of the projection system, a mirror, a heat sink and an internal chamber wall, wherein the repeating structure comprises a series of ridges. | ||
| 地址 | Veldhoven NL | ||