发明名称 Apparatus for applying gating agents to a substrate and image generation kit
摘要 Apparatus and methods for controlling application of a substance to a substrate involve the use of one or more gating agents that block the substance from or attracts the substance to the substrate. The apparatus and methods may utilize ink jet technology to apply the gating agent directly to the substrate or to an intermediate surface. The substance may be an ink, an electrically conductive material, a magnetic material, a carrier for a therapeutic, diagnostic, or marking substance other than an ink, a carrier or any other substance.
申请公布号 US8967044(B2) 申请公布日期 2015.03.03
申请号 US201012904840 申请日期 2010.10.14
申请人 R.R. Donnelley & Sons, Inc. 发明人 DeJoseph Anthony B.;Cyman, Jr. Theodore F.;Hook Kevin J.;Moscato Anthony V.;Haan Henderikus A.;Warmus James L.
分类号 B41F1/18;B41C1/10;B41F7/24;B41F7/30;B41F35/00;B41J2/005;B41J11/00;B41J2/01 主分类号 B41F1/18
代理机构 McCracken & Gillen LLC 代理人 McCracken & Gillen LLC
主权项 1. An apparatus for applying first and second gating agents and a principal substance to a substrate to produce an end product, comprising: first and second sources of the first and second gating agents, respectively; first and second sets of nozzles in fluid communication with the first and second sources, respectively; a controller operable to deposit the first and second gating agents independently through each of the first and second sets of nozzles onto the substrate; and means operable after the first and second gating agents have been deposited onto the substrate for applying the principal substance to the substrate in areas defined by the deposited first and second gating agents; wherein the principal substance is applied to a region of the substrate having both the first and second gating agents such that at least one of the first and second gating agents prevents transfer of the principal substance to areas of the substrate having the at least one of the first and second gating agents, and the substrate with the principal substance comprises the end product.
地址 Chicago IL US