发明名称 |
Electromagnetic wave reflective film and method for producing same |
摘要 |
Method for producing an electromagnetic wave reflective film by a first selective reflection layer forming process of using a transparent substrate; applying a first selective reflection layer forming coating solution on the transparent substrate to form a first selective reflection layer forming layer; irradiating the first selective reflection layer forming layer with ultraviolet rays at a dose in the range of 25 mJ/cm2 to 800 mJ/cm2; and thereby forming a first selective reflection layer; and a second selective reflection layer forming process of: using a second selective reflection layer forming coating solution; applying the second selective reflection layer forming coating solution on the first selective reflection layer so as to be in direct contact therewith to form a second selective reflection layer forming layer; irradiating the second selective reflection layer forming layer with ultraviolet rays; and thereby forming a second selective reflection layer. |
申请公布号 |
US8968836(B2) |
申请公布日期 |
2015.03.03 |
申请号 |
US201113807144 |
申请日期 |
2011.05.18 |
申请人 |
Dai Nippon Printing Co., Ltd. |
发明人 |
Hamada Satoru;Takeshige Shoji;Kashima Keiji |
分类号 |
B05D5/06;G02B5/30;G02F1/13 |
主分类号 |
B05D5/06 |
代理机构 |
Ladas & Parry LLP |
代理人 |
Ladas & Parry LLP |
主权项 |
1. A method for producing an electromagnetic wave reflective film, the method comprising steps of:
a first selective reflection layer forming process of: using a transparent substrate; applying a first selective reflection layer forming coating solution containing a rodlike compound represented by the following structural formula (I), a first chiral agent that imparts rotatory properties to the rodlike compound, and a first leveling agent, on the transparent substrate to form a first selective reflection layer forming layer; irradiating the first selective reflection layer forming layer with ultraviolet ray at a dose in the range of 25 mJ/cm2 to 800 mJ/cm2; and thereby forming a first selective reflection layer; and a second selective reflection layer forming process of: using a second selective reflection layer forming coating solution containing a rodlike compound represented by the following structural formula (I), a second chiral agent that imparts rotatory properties to the rodlike compound, and a second leveling agent; applying the second selective reflection layer forming coating solution on the first selective reflection layer so as to be in direct contact therewith to form a second selective reflection layer forming layer; irradiating the second selective reflection layer forming layer with ultraviolet ray; and thereby forming a second selective reflection layer: |
地址 |
Tokyo-to JP |