发明名称 Electromagnetic wave reflective film and method for producing same
摘要 Method for producing an electromagnetic wave reflective film by a first selective reflection layer forming process of using a transparent substrate; applying a first selective reflection layer forming coating solution on the transparent substrate to form a first selective reflection layer forming layer; irradiating the first selective reflection layer forming layer with ultraviolet rays at a dose in the range of 25 mJ/cm2 to 800 mJ/cm2; and thereby forming a first selective reflection layer; and a second selective reflection layer forming process of: using a second selective reflection layer forming coating solution; applying the second selective reflection layer forming coating solution on the first selective reflection layer so as to be in direct contact therewith to form a second selective reflection layer forming layer; irradiating the second selective reflection layer forming layer with ultraviolet rays; and thereby forming a second selective reflection layer.
申请公布号 US8968836(B2) 申请公布日期 2015.03.03
申请号 US201113807144 申请日期 2011.05.18
申请人 Dai Nippon Printing Co., Ltd. 发明人 Hamada Satoru;Takeshige Shoji;Kashima Keiji
分类号 B05D5/06;G02B5/30;G02F1/13 主分类号 B05D5/06
代理机构 Ladas & Parry LLP 代理人 Ladas & Parry LLP
主权项 1. A method for producing an electromagnetic wave reflective film, the method comprising steps of: a first selective reflection layer forming process of: using a transparent substrate; applying a first selective reflection layer forming coating solution containing a rodlike compound represented by the following structural formula (I), a first chiral agent that imparts rotatory properties to the rodlike compound, and a first leveling agent, on the transparent substrate to form a first selective reflection layer forming layer; irradiating the first selective reflection layer forming layer with ultraviolet ray at a dose in the range of 25 mJ/cm2 to 800 mJ/cm2; and thereby forming a first selective reflection layer; and a second selective reflection layer forming process of: using a second selective reflection layer forming coating solution containing a rodlike compound represented by the following structural formula (I), a second chiral agent that imparts rotatory properties to the rodlike compound, and a second leveling agent; applying the second selective reflection layer forming coating solution on the first selective reflection layer so as to be in direct contact therewith to form a second selective reflection layer forming layer; irradiating the second selective reflection layer forming layer with ultraviolet ray; and thereby forming a second selective reflection layer:
地址 Tokyo-to JP