MULTILAYER STRUCTURE, DEVICE USING SAME, AND MANUFACTURING METHOD THEREFOR

摘要

Provided are a novel multilayer structure that can be used to protect a device and a device using the multilayer structure. The disclosed multilayer structure is a multilayer structure including a substrate and a barrier layer stacked on the substrate. The 3% strain tension of the substrate in at least one direction is at least 2000 N/m. The barrier layer contains a reaction product (R). The reaction product (R) is a reaction product formed by a reaction at least between a metal oxide (A) and a phosphorus compound (B). In an infrared absorption spectrum of the barrier layer in a range of 800 to 1400 cm -1 , a wavenumber (n 1 ) at which maximum infrared absorption occurs is in a range of 1080 to 1130 cm -1 . A metal atom constituting the metal oxide (A) is essentially an aluminum atom.