发明名称 |
DRAM MIM capacitor using non-noble electrodes |
摘要 |
A method for forming a capacitor stack includes forming a first bottom electrode layer including a conductive metal nitride material. A second bottom electrode layer is formed above the first bottom electrode layer. The second bottom electrode layer includes a conductive metal oxide material, wherein the crystal structure of the conductive metal oxide material promotes a desired high-k crystal phase of a subsequently deposited dielectric layer. A dielectric layer is formed above the second bottom electrode layer. Optionally, an oxygen-rich metal oxide layer is formed above the dielectric layer. Optionally, a third top electrode layer is formed above the oxygen-rich metal oxide layer. The third top electrode layer includes a conductive metal oxide material. A fourth top electrode layer is formed above the third top electrode layer. The fourth top electrode layer includes a conductive metal nitride material. |
申请公布号 |
US8969169(B1) |
申请公布日期 |
2015.03.03 |
申请号 |
US201314033326 |
申请日期 |
2013.09.20 |
申请人 |
Intermolecular, Inc. |
发明人 |
Chen Hanhong;Chi David;Hashim Imran;Horikawa Mitsuhiro;Malhotra Sandra G. |
分类号 |
H01L21/00;H01L49/02 |
主分类号 |
H01L21/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method for forming a capacitor stack, the method comprising:
forming a first bottom electrode layer above a surface of a substrate, wherein the first bottom electrode layer comprises a conductive metal nitride material; forming a second bottom electrode layer above the first bottom electrode layer, wherein the second bottom electrode layer comprises a conductive metal oxide material; forming a dielectric layer above the second bottom electrode layer; forming an oxygen-rich metal oxide layer above the dielectric layer; and forming a top electrode layer above the oxygen-rich metal oxide layer, wherein the top electrode layer comprises a conductive metal nitride material. |
地址 |
San Jose CA US |