发明名称 |
Methods of flash reduction and patterning of graphite oxide and its polymer composites |
摘要 |
A method of reducing a film of graphite oxide. In one embodiment, the method includes the steps of providing a film of graphite oxide with a thickness d0; and delivering optical energy in a single pulse to the film of graphite oxide at a distance no more than 1.0 cm away from the film of graphite oxide to reduce the film of graphite oxide to a film of graphene with a thickness d, wherein the optical energy has a radiant exposure in the range of between 0.1 and 2 J/cm2, and wherein the thickness d is greater than the thickness d0. In one embodiment, the thickness d≧10×d0. |
申请公布号 |
US8968525(B2) |
申请公布日期 |
2015.03.03 |
申请号 |
US201012714955 |
申请日期 |
2010.03.01 |
申请人 |
Northwestern University |
发明人 |
Huang Jiaxing;Cote Laura;Silva Rodolfo Cruz |
分类号 |
C01B31/00;C01B31/04;B82Y30/00;B82Y40/00;G03F7/004;G03F7/20;H01B1/04;H01B1/24 |
主分类号 |
C01B31/00 |
代理机构 |
Morris, Manning & Martin, LLP |
代理人 |
Morris, Manning & Martin, LLP ;Xia, Esq. Tim Tingkang |
主权项 |
1. A method for reducing a film of graphite oxide, comprising:
(a) providing a film of graphite oxide with a thickness d0; and (b) delivering optical energy in a single pulse from a flash lamp to the film of graphite oxide at a distance no more than 1.0 cm away from the film of graphite oxide to reduce the film of graphite oxide to a film of graphene with a thickness d, wherein the optical energy has a radiant exposure in the range of between 0.1 and 2 J/cm2, and wherein the thickness d is greater than the thickness d0. |
地址 |
Evanston IL US |