发明名称 Process for fabricating a mask with submillimetre apertures for the production of a submillimetre grid, and submillimetre grid
摘要 <p>Production of a mask on part of a functional glass substrate involves (a) applying a first layer using a solution of stabilized, dispersed colloidal particles in a solvent and (b) drying the first layer until a mask-forming network of straight-sided interstices is formed. An independent claim is included for a grid produced by the process, having a ratio of spacing between the strands to width of the strands of 7-20.</p>
申请公布号 KR101496980(B1) 申请公布日期 2015.03.03
申请号 KR20097022043 申请日期 2008.03.21
申请人 发明人
分类号 C03C4/00;C03C17/00;C03C17/22 主分类号 C03C4/00
代理机构 代理人
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