| 发明名称 | Method and apparatus for electron beam lithography | ||
| 摘要 | A system using an energy beam to expose patterns on a wafer includes first mirror elements, a multiplexer element, and second mirror elements. The first and second mirror elements are dynamically controlled to reflect the energy beam to the wafer. The first mirror elements are configured in a first chain having a first data input and a first data output. The multiplexer element includes a second data input, a third data input, a select input, and a second data output. The third data input is coupled to the first data output. The second mirror elements are configured in a second chain having a fourth data input. | ||
| 申请公布号 | US8969836(B1) | 申请公布日期 | 2015.03.03 |
| 申请号 | US201314090000 | 申请日期 | 2013.11.26 |
| 申请人 | Taiwan Semiconductor Manufacturing Company, Ltd. | 发明人 | Chen Yu-Chi |
| 分类号 | H01J3/14;H01J37/29;H01J37/147;H01J37/30;G06F17/50;H01J37/317 | 主分类号 | H01J3/14 |
| 代理机构 | Haynes and Boone, LLP | 代理人 | Haynes and Boone, LLP |
| 主权项 | 1. A system using an energy beam to expose patterns on a wafer, comprising: first mirror elements; a multiplexer element; and second mirror elements; wherein: the first and second mirror elements are dynamically controlled to reflect the energy beam to the wafer; the first mirror elements are configured in a first chain having a first data input and a first data output; the multiplexer element includes a second data input, a third data input, a select input, and a second data output; the third data input is coupled to the first data output; and the second mirror elements are configured in a second chain having a fourth data input. | ||
| 地址 | Hsin-Chu TW | ||