Microlithography projection optical system, tool and method of production

摘要

A microlithography projection optical system is disclosed. The system can include a plurality of optical elements arranged to image radiation having a wavelength λ from an object field in an object plane to an image field in an image plane. The plurality of optical elements can have an entrance pupil located more than 2.8 m from the object plane. A path of radiation through the optical system can be characterized by chief rays having an angle of 3° or more with respect to the normal to the object plane. This can allow the use of phase shifting masks as objects to be imaged, in particular for EUV wavelengths.

主权项

1. An optical system, comprising:
a plurality of optical elements arranged to image radiation from an object field in an object plane to an image field in an image plane, wherein the system has an entrance pupil located more than 2.8 m from the object plane, a path of the radiation of the system has chief rays that are at an angle of 3° or more with respect to a normal at the object plane, the image field has a minimum radius of 300 mm, at the object plane all chief rays are parallel to each other within 0.5°, and the system is a microlithography projection optical system.