发明名称 Anthrapyridone sulfonic acid compounds and their preparation methods and applications
摘要 The present invention relates to a class of compounds of general formula (I) or their salts of general formula (II):; In formula (I)-(II), the substituents (A)p and (SO3H)n on the benzene ring are at the ortho, meta or para position, n is 0-2, and p is 0-3; M is selected from Li+, Na+, K+, NH4+ or organic ammonium salt N+R1R2R3R4, where R1, R2, R3, R4 are the same or different H, C1-18 alkyl groups, cyclohexyl groups, CH2CH2OH, CH(CH3)CH2OH or benzyl groups; where p>0, A stands for the same or different groups selected from: H, CN, NO2, NH2, F, Cl, Br, C1-18 alkyl group, cyclohexyl group, phenyl group, benzyl group, phenoxy group, C1-18 alkoxy group, C1-18 alkylthio group, SO2CH═CH2, SO2CH2CH2A1, NR6COR5 or NR6SO2R5.
申请公布号 US8968453(B2) 申请公布日期 2015.03.03
申请号 US201113583282 申请日期 2011.01.14
申请人 Zhuhai Ninestar Management Co., Ltd.;Dalian University of Technology 发明人 Peng Xiaojun;Liu Tao;Wu Jinhe;Zhang Rong;Wang Jingyue;Wang Feng;Li Shaolei;Zhang Jianzhou;Yang Zhengru
分类号 C09D11/02;C09B5/14;C09D11/328;C09D11/037;C09B62/04;C09B62/465;C09B62/503 主分类号 C09D11/02
代理机构 Jackson IPG PLLC 代理人 Jackson IPG PLLC
主权项 1. A class of compounds of general formula (I) and its salts of general formula (II) wherein in the general formula (I) and (II), substituents (A)p and (SO3H)n are at the ortho, meta or para position of the benzene ring with n of 0-2 and p of 0-3; M is selected from the group consisting of Li+, Na+, K+, NH4+ and organic ammonium salt N+R1R2R3R4, of which R1, R2, R3, R4 are the same or different H, C1-18 alkyl group, cyclohexyl group, CH2CH2OH, CH(CH3)CH2OH or benzyl group; wherein p>0, A is the same or different groups selected from the group consisting of: H, CN, NO2, NH2, F, Cl, Br, C1-18 alkyl group, cyclohexyl group, phenyl group, benzyl group, phenoxy, C1-18 alkoxy group, C1-18 alkylthio group, SO2CH═CH2, SO2CH2CH2A1, NR6COR5, NR6SO2R5, and NR6-L; wherein, A1 stands for groups comprising at least one of O, S, and N; R5 stands for C1-18 alkyl group, phenyl group, tolylene, benzyl group, CF3, or (C6H5-m)(CO2M)m, of which m is 0-3, (C6H5-m)(CO2M)m is a benzene ring with m number of CO2M substituents which may be at any position of the benzene ring; R6 stands for H, C1-4 alkyl group or CH2CH2OH; wherein A2 and A1 in general formula L have the same definition but A2 and A1 in general formula L can each be the same or different compounds.
地址 Zhuhai, Guangdong CN