发明名称 DETECTION APPARATUS, EXPOSURE APPARATUS, DEVICE FABRICATION METHOD AND FILTER
摘要 <p>The present invention provides a detection apparatus which detects an object to be detected, the apparatus including an illumination system configured to illuminate the object with light containing a first wavelength range and a second wavelength range different from the first wavelength range, a detector configured to detect light from the object illuminated by the illumination system, and an optical member configured to set a transmittance for light in the first wavelength range and a transmittance for light in the second wavelength range to be different from each other, thereby reducing a difference between an intensity value of the light which has the first wavelength range and is detected by the detector and an intensity value of the light which has the second wavelength range and is detected by the detector.</p>
申请公布号 KR101497765(B1) 申请公布日期 2015.03.02
申请号 KR20120058112 申请日期 2012.05.31
申请人 发明人
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
代理机构 代理人
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