发明名称 MANUFACTURING METHOD OF MICROLENS SUBSTRATE, MICROLENS SUBSTRATE, ELECTRO-OPTIC DEVICE, AND ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of a microlens substrate, a microlens substrate, an electro-optic device, and an electronic apparatus capable of improving display quality.SOLUTION: A manufacturing method of a microlens substrate includes the steps of: forming microlenses 51 in an effective chip area 501 of a substrate 20a; forming a lens layer precursor film 52a on the microlenses 51 and substrate 20a; and removing a part of an area of the lens layer precursor film 52a not overlapping with the microlenses 51 in plan view, where the removing step does not include forming of a resist pattern 43 on the lens layer precursor film 52a in an area around the effective chip area 501.
申请公布号 JP2015040983(A) 申请公布日期 2015.03.02
申请号 JP20130172040 申请日期 2013.08.22
申请人 SEIKO EPSON CORP 发明人 WADA MASAYUKI
分类号 G02B3/00;G02F1/13;G02F1/1333;G02F1/1335 主分类号 G02B3/00
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