IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS

摘要

An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid.

主权项

1. A device manufacturing process comprising:
(i) adding a component to a liquid, the component having a vapor pressure greater than 0.1 kPa; (ii) exposing a photosensitive substrate to radiation, wherein the radiation has passed through the liquid comprising the component prior to reaching the photosensitive substrate; wherein the adding of the component increases the ion concentration in the liquid.