| 发明名称 |
PHOTOSENSITIVE COMPOSITION AND PHOTORESIST |
| 摘要 |
A photosensitive composition and a photoresist are provided. The photoresist is formed by compounding a photosensitive composition. The photosensitive composition includes a binder agent, a first photomonomer, and a photo initiator. The first photomonomer has at least a lactic oligomer and at least two unsaturated acrylic functional groups, wherein the first photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent. The photoinitiator has an amount of about 0.5-15 parts by weight relative to 100 parts by weight of the solid content of the binder agent. |
| 申请公布号 |
US2015056556(A1) |
申请公布日期 |
2015.02.26 |
| 申请号 |
US201314141091 |
申请日期 |
2013.12.26 |
| 申请人 |
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE |
发明人 |
LIN Hsien-Kuang;CHEN Sue-May;JENG Jauder;LIU Yu-Lin;CHEN Su-Huey |
| 分类号 |
G03F7/033 |
主分类号 |
G03F7/033 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photosensitive composition, comprising:
a binder agent; a first photomonomer having at least a lactic oligomer and at least two unsaturated acrylic functional groups, wherein the first photomonomer has an amount of about 25-95 parts by weight relative to 100 parts by weight of a solid content of the binder agent; and a photoinitiator, wherein the photoinitiator has an amount of about 0.5-15 parts by weight relative to 100 parts by weight of the solid content of the binder agent. |
| 地址 |
Hsinchu TW |
